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Ion‐Beam Mixing of Iron Oxide Marker Layers in Doped and Undoped Alumina Thin Films
Author(s) -
Cooper Elizabeth A.,
Nastasi Michael
Publication year - 1994
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1994.tb06988.x
Subject(s) - materials science , dopant , doping , amorphous solid , ion beam mixing , oxide , thin film , iron oxide , ion beam , analytical chemistry (journal) , ion , argon , matrix (chemical analysis) , metallurgy , composite material , chemistry , ion beam deposition , nanotechnology , crystallography , optoelectronics , chromatography , organic chemistry
Thin films of iron‐doped and pure amorphous alumina with embedded marker layers of iron oxide (Fe 2 O 3 ) were ion‐beam mixed with 210‐keV argon in a temperature range of −164° to 750°C. The marker exhibited a strong temperature‐dependent spreading ( T > 470°C) into the undoped alumina matrix, but the marker spreading into the iron‐doped matrix was inhibited by the presence of the dopant.