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Synthesis and Characterization of Amorphous Si 2 N 2 O
Author(s) -
Weeren Remco,
Leone Edgar A.,
Curran Sean,
Klein Lisa C.,
Danforth Stephen C.
Publication year - 1994
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1994.tb04664.x
Subject(s) - x ray photoelectron spectroscopy , amorphous solid , silicon oxynitride , materials science , analytical chemistry (journal) , silicon , phase (matter) , full width at half maximum , crystallography , silicon nitride , chemical engineering , chemistry , metallurgy , organic chemistry , optoelectronics , engineering
Amorphous silicon oxynitride powder was synthesized by nitridation of high‐purity silica in ammonia at 1120°C. The resulting material was X‐ray amorphous, and its chemical characteristics were determined by X‐ray photoelectron spectroscopy (XPS) and 29 Si nuclear magnetic resonance (NMR). The XPS analysis showed a shift to lower binding energies for the Si 2 p peak with increasing nitrogen content. Upon initial nitridation, the full width at half maximum (FWHM) of the Si 2 p peak increased, but decreased again at higher nitrogen contents, thus showing the formation of a silicon oxynitride phase with a single or small range of composition. The 29 Si NMR analysis showed the formation of (amorphous) Si 3 N 4 (Si–N 4 ) and possibly two oxynitride phases (Si–N 3 O, Si–N 2 O 2 ). It is concluded that while XPS, FT‐IR, and nitrogen analysis may show the formation of an homogeneous, amorphous silicon oxynitride (Si 2 N 2 O) phase, the formation of phase–pure, amorphous Si 2 N 2 O is extremely difficult via this route.