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Development of Tantalum Pentoxide Coatings by Chemical Vapor Deposition
Author(s) -
Graham David W.,
Stinton David P.
Publication year - 1994
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1994.tb04597.x
Subject(s) - tantalum pentoxide , tantalum , chemical vapor deposition , materials science , coating , deposition (geology) , microstructure , pentoxide , atmospheric temperature range , chemical engineering , corrosion , metallurgy , vanadium , composite material , nanotechnology , thermodynamics , paleontology , physics , sediment , engineering , biology
Thermochemical considerations clearly indicate a need for the protection of SiC and Si 3 N 4 materials from HC1‐ and Na 2 SO 4 ‐induced corrosion. Ta 2 O 5 has been identified as a material which may be suitable for such a protective coating. Thermodynamic calculations have indicated a range of temperatures, pressures, and reactant concentrations under which Ta 2 O 5 coatings may be formed as a single phase by chemical vapor deposition. Ta 2 O 5 coatings exhibiting a range of microstructures were obtained experimentally.