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Wettability and Interfacial Reaction between Molten lron and Zirconia Substrates
Author(s) -
Nakashima Kunihiko,
Takihira Kenji,
Miyazaki Takashi,
Mori Katsumi
Publication year - 1993
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1993.tb06601.x
Subject(s) - sessile drop technique , cubic zirconia , wetting , contact angle , electron microprobe , materials science , oxygen , surface tension , chemical engineering , drop (telecommunication) , dissociation (chemistry) , substrate (aquarium) , penetration (warfare) , metallurgy , analytical chemistry (journal) , mineralogy , chemistry , composite material , chromatography , ceramic , telecommunications , physics , oceanography , organic chemistry , quantum mechanics , operations research , computer science , engineering , geology
The surface tension of, and the contact angle formed by, molten iron on three types of commercial zirconia substrates containing 8 mol% Y 2 O 3 , 9 mol% MgO, or 11 mol% CaO were measured over a wide range of oxygen concentration in the molten iron by the sessile drop method. The solidified metal–substrate interface was examined in an SEM equipped with an EPMA. The surface tension of molten iron decreased with increasing oxygen concentration. The contact angle of molten iron increased rapidly with increasing oxygen concentration and reached a local maximum value at an oxgyen concentration of ∼100 ppm, and then decreased with increasing oxygen concentration. At lower oxygen concentration, dissociation of ZrO 2 was observed. For the ZrO 2 –9 mol% MgO substrate, segregation of MgO to the interface was observed. For the ZrO 2 –11 mol% CaO substrate, segregation of CaO and the precipitation of small ZrO 2 particles in the segregation layer of CaO were observed at the interface. Conversely, at higher oxygen concentration, penetration of molten iron into the grain boundaries was observed in all types of zirconia substrates.