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Preparation of Magnesium Nitride Powder by Low‐Pressure Chemical Vapor Deposition
Author(s) -
Murata Tsuyoshi,
Itatani Kiyoshi,
Howell F. Scott,
Kishioka Akira,
Kinoshita Makio
Publication year - 1993
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1993.tb04036.x
Subject(s) - magnesium , chemical vapor deposition , acicular , nitride , chemistry , nitrogen , vapor pressure , inorganic chemistry , analytical chemistry (journal) , materials science , nuclear chemistry , crystallography , organic chemistry , microstructure , layer (electronics)
Submcrometer‐scale magnesium nitride (Mg 3 N 2 ) powder was prepared by low‐pressure chemical vapor deposition, i.e., the reaction of Mg vapor with mixed NH 3 –N 2 gases at 800°C under a pressure of ∼1 kPa. The mixing ratios of NH 3 –N 2 gases were 0% NH 3 –100% N 2 (pure N 2 ), 20% NH 3 –80% N 2 , 40% NH 3 –60% N 2 , 60% NH 3 –40% N 2 , 80% NH 3 –20% N 2 , and 100% NH 3 –0% N 2 (pure NH 3 ). The reactions between Mg vapor and NH 3 –N 2 gases produced platy Mg 3 N 2 particles <0.2 μm and acicular particles with long‐axis length of ∼0.2 μm, whereas the reaction of Mg vapor with pure NH 3 gas produced spherical Mg 3 N 2 particles with diameters of ∼0.1 μm.

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