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Neutron Reflectometry Characterization of Interface Width between Sol‐Gel Titanium Dioxide and Silicon Dioxide Thin Films
Author(s) -
Keddie Joseph L.,
Norton Laura J.,
Kramer Edward J.,
Giannelis Emmanuel P.
Publication year - 1993
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1993.tb03978.x
Subject(s) - silicon dioxide , titanium dioxide , neutron reflectometry , materials science , bilayer , silicon , reflectometry , sol gel , thin film , analytical chemistry (journal) , surface finish , neutron , composite material , optoelectronics , nanotechnology , chemistry , neutron scattering , chromatography , small angle neutron scattering , time domain , biochemistry , physics , quantum mechanics , membrane , computer science , computer vision
Neutron reflectometry (NR) was used to directly measure the interface width between a titanium dioxide and a silicon dioxide film deposited by sol‐gel processing. In a bilayer heated to 450°C, NR measurements showed that the interface width is 0.8 nm. This width is the same as the roughness of a sol‐gel silicon dioxide surface after the same heat treatment, suggesting no interdiffusion or mixing at the bilayer interface.