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Preparation and Physical Properties of Radiofrequency‐Sputtered Amorphous Films in the System AlPO 4 –TiO 2
Author(s) -
Hanada Teiichi,
Kato Yoshinari,
Tanabe Setsuhisa,
Soga Naohiro
Publication year - 1992
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1992.tb05583.x
Subject(s) - amorphous solid , titanium , materials science , thermal expansion , infrared spectroscopy , ion , analytical chemistry (journal) , refractive index , absorption spectroscopy , sputtering , coordination number , absorption (acoustics) , spectroscopy , thin film , crystallography , chemistry , nanotechnology , optics , composite material , metallurgy , optoelectronics , physics , organic chemistry , chromatography , quantum mechanics
Amorphous films in the system AlPO 4 –TiO 2 were prepared by an rf‐sputtering method, and their physical properties, such as density, refractive index, and thermal expansion coefficient, and the infrared absorption spectra were measured. The thermal expansion coefficient increased linearly with increasing TiO 2 content. The results of the molar refractivity and the infrared absorption spectra indicated that the coordination number of titanium ions in these films is higher than that in SiO 2 –TiO 2 glasses with a negative thermal expansion, in which Ti 4+ ions are tetrahedrally coordinated. In order to confirm the coordination state of the titanium ions in these amorphous films, titanium K ‐band emission spectra were obtained by X‐ray emission spectroscopy, revealing sixfold coordination. The higher coordination state of Ti 4+ was considered to account for these amorphous films not exhibiting negative thermal expansion, as in the SiO 2 –TiO 2 system.