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FOURIER ANALYSIS OF X‐RAY PATTERNS OF VITREOUS SiO 2 AND B 2 O 3 *
Author(s) -
Warren B. E.,
Krutter H.,
Morningstar O.
Publication year - 1992
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1992.tb05433.x
Subject(s) - fourier transform , boron , x ray crystallography , diffraction , crystallography , scattering , atom (system on chip) , distribution (mathematics) , silicon , chemistry , materials science , analytical chemistry (journal) , physics , optics , organic chemistry , chromatography , quantum mechanics , computer science , embedded system , mathematical analysis , mathematics
The X‐ray scattering curves for vitreous SiO 2 and B 2 O 3 are obtained in a vacuum camera, using monochromatic Mo and Cu radiation. A Fourier analysis of the scattering curve gives directly a curve representing the distribution of neighboring atoms about any one atom. For SiO 2 , the distribution curve establishes difinitely the tetrahedral silicon‐oxygen network. The distribution curve for B 2 O 3 indicates a triangular coördination, each boron surrounded by three oxygens, and each oxygen shared between two borons. The interatomic distances which are found are in good agreement with the values found in crystalline silicates and borates. The importance of the new Fourier method of analysis of glass diffraction patterns is emphasized by the fact that the distribution curves which are obtained are unique, no assumptions as to structure being involved.