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Low‐Temperature Chemical Vapor Deposition Tungsten Carbide Coatings for Wear/Erosion Resistance
Author(s) -
Garg Diwakar,
Dyer Paul N.,
Dimos Duane B.,
Sunder Swaminathan,
Hintermann Hans E.,
Maillat Michel
Publication year - 1992
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1992.tb04176.x
Subject(s) - materials science , tungsten , tungsten carbide , metallurgy , chemical vapor deposition , microstructure , lamellar structure , carbide , deposition (geology) , tribology , ferrous , nanotechnology , paleontology , sediment , biology
A new chemical vapor deposition (CVD) process has been developed to deposit hard coatings, containing tungsten carbide, at temperatures below 500°C. These coatings, which have been applied to both ferrous and nonferrous alloys, exhibit excellent resistance to wear and erosion. The coatings comprise a mixture of tungsten and the tungsten carbide, the latter being present as W 2 C, W 2 C + W 3 C, or W 3 C. The coatings' composition and properties can be controlled by varying the CVD process parameters. The unique lamellar, fine‐grained microstructures of these coatings contribute to their good tribological properties.