Premium
Synthesis and Preparation of Lanthanum Aluminate Target for Radio‐Frequency Magnetron Sputtering
Author(s) -
Sung Gun Yong,
Kang Kwang Yong,
Park SinChong
Publication year - 1991
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1991.tb06904.x
Subject(s) - materials science , crystallite , sputter deposition , calcination , thin film , lanthanum , cavity magnetron , aluminate , analytical chemistry (journal) , sintering , perovskite (structure) , annealing (glass) , sputtering , mineralogy , chemical engineering , metallurgy , inorganic chemistry , nanotechnology , chemistry , catalysis , biochemistry , chromatography , cement , engineering
A polycrystalline LaAlO 3 target for the radio‐frequency (rf) magnetron sputterings of LaAlO 3 thin films has been prepared. These films serve as a buffer layer for high‐ T c YBa 2 Cu 3 O 7– x superconducting thin films on Si. Synthesis of lanthanum aluminate powder from a mixture of La 2 O 3 and Al 2 O 3 powders was performed by calcining from 1000° to 1600°C in air. Characterization of the calcined powders by X‐ray diffraction indicates that full development of LaAlO 3 phase was evident in the sample calcined for 3 h at 1600°C in air. A polycrystalline LaAlO 3 target was prepared by heat treatment at 1500°C for 2 h in air after pressureless sintering at 1750°C for 3 h in Ar. Thin films of the LaAlO 3 on Si (100) were obtained by rf magnetron sputtering using the target and oxygen‐annealing the as‐deposited films.