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Improving Probability of Flaw Detection in Ceramics by X‐ray Imaging Energy level Optimization
Author(s) -
Cotter Daniel J.,
Koenigsberg William D.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb09827.x
Subject(s) - silicon nitride , ceramic , materials science , void (composites) , nitride , x ray , silicon , optics , composite material , optoelectronics , physics , layer (electronics)
Roy E. Wysnewski and George Hamilton Fuji Film, Inc., Stamford, Connecticut 06907 Results are presented from a study to optimize X‐ray imaging energy for maximum probability of detection (POD) of defects in different thicknesses of silicon nitride ceramics. Selection curves for X‐ray accelerating potential were developed based on equilibrium half‐value layers over the range of 40 to 120 kV for silicon nitride. Optimum energy values were corroborated by determining the probability of detecting voids in varying thicknesses of silicon nitride with microfocus projection radiography at selected X‐ray accelerating potentials. At a 1.1% thickness sensitivity (nominally, a 100‐μm void in a 10‐mm block), POD was improved from 14% to 91% when the optimum accelerating potential was used for imaging.