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Time‐Dependent Solution to the Tai‐Chou Chemical Vapor Infiltration Model
Author(s) -
Currier Robert P.,
Valone Steven M.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb09825.x
Subject(s) - infiltration (hvac) , isothermal process , chemical vapor infiltration , mechanics , materials science , boundary value problem , thermodynamics , composite material , mathematics , physics , porosity , mathematical analysis
A recently proposed steady‐state isothermal model for chemical vapor infiltration in parallel cylindrical pores has been extended to include transient behavior. Availability of a time‐dependent solution should prove useful in comparison with experimental data and validation of the assumed boundary conditions. Attention is also drawn to analogous problems in the heat transfer literature which may prove useful in development of enhanced vapor infiltration models of this class.