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Experimental Whisker Growth and Thermodynamic Study of the Hafnium‐Carbon System for Chemical Vapor Deposition Applications
Author(s) -
Lackey W. J.,
Hanigofsky John A.,
Freeman Garth B.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb09801.x
Subject(s) - phase diagram , chemical vapor deposition , gibbs free energy , whisker , hafnium , deposition (geology) , thermodynamics , materials science , carbide , partial pressure , chemistry , phase (matter) , analytical chemistry (journal) , metallurgy , nanotechnology , zirconium , paleontology , physics , organic chemistry , sediment , biology , chromatography , oxygen
Chemical vapor deposition of nonstoichiometric hafnium carbide is studied by computer minimization of the Gibbs free energy of the system. Isostoichiometric curves in the HfC 1‐ x region of the deposition diagram are calculated as a function of HfCI 4 , CH 4 , and H 2 concentration and reaction temperature. Possible experimental reactions are investigated using thermodynamic efficiency and partial pressure diagrams. A comparison between the calculated solid‐phase regions and the HfC phase diagram is given, and experimental results for HfC whiskers are also compared with the calculations.