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Ion‐Beam Analysis of Silica Sol‐Gel Films: Structural and Compositional Evolution
Author(s) -
Keddie J. L.,
Giannelis E. P.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb06728.x
Subject(s) - amorphous solid , rutherford backscattering spectrometry , silicate , annealing (glass) , ion beam analysis , sol gel , amorphous silica , elastic recoil detection , silicate glass , ion , ion beam , materials science , chemical composition , recoil , analytical chemistry (journal) , chemical engineering , mass spectrometry , mineralogy , thin film , chemistry , crystallography , nanotechnology , composite material , chromatography , organic chemistry , physics , quantum mechanics , engineering
Rutherford backscattering and forward recoil spectrometry have been used to determine the chemical composition and density of SiO 2 sol‐gel films. The as‐deposited films are relatively dense, because of considerable interpenetration of weakly branched silicate precursors, while they contain significant amounts of hydroxyl groups in their structure. Annealing in flowing Ar increases the density of the films with values approaching that of amorphous silica at temperatures as low as 450°C but it fails to completely remove all the hydroxyl groups from the structure.