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Solid‐State Bonding of Silicon Nitride Ceramics with Nickel‐Chromium Alloy Interlayers
Author(s) -
Nakamura Mamoru,
Peteves Stathis D.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb05183.x
Subject(s) - materials science , ceramic , silicon nitride , alloy , nitride , composite material , hot pressing , bond strength , flexural strength , layer (electronics) , chromium , metallurgy , adhesive
Si 3 N 4 ceramics with Al 2 O 3 and Y 2 O 3 as additives were joined with an 80 wt% Ni‐20 wt% Cr alloy sheet as an insert layer. Joining was performed by hot‐pressing between 1000° and 1350°C in argon, and under uniaxial pressures in the range of 50 to 100 MPa. The average joint strength, evaluated by four‐point bending, was large enough (>300 MPa) for some industrial applications. However, the scatter in strength was relatively large, because of the formation of interfacial pores, which were not distributed uniformly at the bond interface. The effects of joining pressure and N 2 gas partial pressure on the formation of the pores were confirmed microscopically. Cr coating on the Si 3 N 4 ceramic before joining contributed to reduce the joint strength scatter. The major interfacial reaction products were Cr nitrides.