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Reaction of Iradium with Metal Carbides in the Temperature Range of 1923 to 2400 K
Author(s) -
Strife James R.,
Smeggil John G.,
Worrell Wayne L.
Publication year - 1990
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1990.tb05123.x
Subject(s) - carbide , stoichiometry , materials science , titanium carbide , metal , iridium , chemical vapor deposition , atmospheric temperature range , microstructure , cermet , carbon fibers , chemical engineering , metallurgy , inorganic chemistry , composite material , chemistry , nanotechnology , catalysis , organic chemistry , thermodynamics , composite number , engineering , ceramic , physics
The reactions of titanium carbide and hafnium carbide with iridium have been studied in thin film couples fabricated by vapor deposition processes. The reaction product layers after exposure in the temperature range of 1923 to 2400 K are dependent on the stoichiometry of the metal carbide layers and range from simple solid solutions to MIr x compounds. The observed microstructures are predictable from available thermochemical data. The morphology of residual carbon in the reacted metal carbide‐iridium product layer varies from interfacial deposits to uniform carbon dispersion and depends upon exposure temperature and metal carbide stoichiometry.