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Diffusion of Sputtered Vanadium, Nickel, and Silver in Lead Magnesium Niobate Ceramic
Author(s) -
Ling Hung C.
Publication year - 1989
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1989.tb06215.x
Subject(s) - vanadium , materials science , sputtering , ceramic , annealing (glass) , argon , nickel , analytical chemistry (journal) , diffusion , thin film , magnesium , mineralogy , metallurgy , chemistry , nanotechnology , thermodynamics , physics , organic chemistry , chromatography
The sputtering of nickel‐vanadium (Ni‐V) and silver (Ag) to form thin films on lead magnesium niobate (PMN) ceramic substrates has been studied. An empirical equation was derived which correlated the average Ni‐V film thickness with three sputtering variables: input power, argon pressure, and sputtering time. The films were dense, smooth, and feature less. Upon annealing at 800°C in argon, both Ni and V diffused into PMN; but reverse diffusion from the ceramic into the metal film was not observed. Vanadium diffused at a faster rate than Ni, leaving pores in the film. The diffusion coefficient of Ni in PMN was determined to be 4.1 × 10 −12 cm 2 /s, whereas the diffusion coefficient of V was determined to be between 3.5 × 10 −9 and 2.9 × 10 −11 cm 2 /s at 800°C. Sputtered Ag was also dense, smooth, and featureless. However, the diffusion of Ag at 800°C in PMN was much slower than that of either Ni or V.