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Destabilization of Zirconia Thermal Barriers in the Presence of V 2 O 5
Author(s) -
SUSNITZKY DAVID W.,
HERTL W.,
CARTER C. BARRY
Publication year - 1988
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1988.tb07570.x
Subject(s) - cubic zirconia , yttria stabilized zirconia , materials science , monoclinic crystal system , thermal barrier coating , tetragonal crystal system , scanning electron microscope , vanadium , transmission electron microscopy , crystallography , mineralogy , chemical engineering , analytical chemistry (journal) , crystal structure , composite material , chemistry , nanotechnology , metallurgy , ceramic , engineering , chromatography
Impurities, such as vanadium, degrade the operating performance of yttria‐stabilized zirconia thermal‐barrier coatings. V 2 O 5 reacts preferentially with Y 2 O 3 , forms YVO 4 , and leads to the destabilization of zirconia thermal‐barrier material. A model experiment has been designed to monitor the destabilization of zirconia thermal barriers by directly exposing thin films of yttria‐stabilized zirconia to V 2 O 5 vapor. The growth of YVO 4 from yttria‐stabilized zirconia and the destabilization of cubic yttria‐stabilized zirconia into tetragonal and/or monoclinic zirconia polymorphs are monitored by selected‐area diffraction and energy‐dispersive X‐ray spectroscopy in the transmission electron microscope. A special crystallographic orientation relation between YVO 4 and cubic zirconia is discussed.