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Hydrogen Surface Etching of Molten Silica
Author(s) -
Mattox Douglas M.,
Smith Harry D.
Publication year - 1988
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1988.tb06402.x
Subject(s) - quenching (fluorescence) , impurity , quartz , materials science , evaporation , surface tension , degree (music) , hydrogen , etching (microfabrication) , melting temperature , mineralogy , analytical chemistry (journal) , chemical engineering , metallurgy , composite material , chemistry , thermodynamics , layer (electronics) , fluorescence , optics , chromatography , physics , organic chemistry , acoustics , engineering
Melting experiments with quartz sand were carried out under H 2 atmospheres at temperatures between 1700° and 1850°C. Upon quenching, fine‐scale, hemispherical, pitted morphologies were noted at the surface of the melts. The degree of uniformity of the resulting features was observed to depend on the temperature of melting. The results are compared with similar reported observations at lower temperatures that are attributed to impurity‐based instabilities in the surface tension and evaporation.