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Thermal Expansion of Y 2 SiO 5 Single Crystals
Author(s) -
O'Bryan Henry M.,
Gallagher Patrick K.,
Berkstresser G.W.
Publication year - 1988
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1988.tb05779.x
Subject(s) - thermal expansion , monoclinic crystal system , anisotropy , atmospheric temperature range , materials science , crystal (programming language) , crystallography , thermal , range (aeronautics) , volume (thermodynamics) , doping , volume expansion , condensed matter physics , mineralogy , crystal structure , optics , thermodynamics , chemistry , physics , composite material , medicine , programming language , computer science , optoelectronics
The thermal expansion of Y 2 SiO 5 crystals has been measured for the principal crystallographic directions and two orthogonal directions in the (010) plane in the temperature range 25° to 200°C. This monoclinic crystal has strongly anisotropic expansions with coefficients which range from 0.6 × 10 −6 /°C for [100] to 11.4 × 10 −6 /°C for [001]. Third‐order polynomials have been calculated from the expansion curves. Data for the β angle and cell volume as a function of temperature are also given. The thermal expansion of Y 2 SiO 5 crystals is not affected by doping with 5% Tb.

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