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Thermochemical Nitridation of Microporous Silica Films in Ammonia
Author(s) -
BROW RICHARD K.,
PANTANO CARLO G.
Publication year - 1987
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1987.tb04845.x
Subject(s) - microporous material , ammonia , materials science , amorphous solid , nitrogen , silicon , inorganic chemistry , silicon nitride , chemical engineering , silicon dioxide , amine gas treating , chemistry , organic chemistry , metallurgy , composite material , engineering
Microporous silicon dioxide thin Films were deposited on silicon substrates from a solution of tetraethoxysilane, ethanol, and water. These were converted to dense oxynitrides through a high‐temperature reaction with ammonia. The ammonia treatments yielded amorphous, compositionally homogeneous films with overall nitrogen contents ranging up to 40 mol%. For ammonia treatments below 800°C, nitrogen was incorporated into the films as an amine species, whereas higher temperature treatments produced a nitride material.