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Formation of β‐Si 3 N 4 Coatings by Chemical Vapor Deposition
Author(s) -
Oda Kiichi,
Yoshio Tetsuo,
OOka Kazuo
Publication year - 1983
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1983.tb09977.x
Subject(s) - chemical vapor deposition , materials science , deposition (geology) , impurity , catalysis , tube furnace , phase (matter) , chemical engineering , tube (container) , vapor phase , combustion chemical vapor deposition , analytical chemistry (journal) , mineralogy , thin film , nanotechnology , chemistry , composite material , carbon film , organic chemistry , thermodynamics , paleontology , physics , sediment , engineering , biology
BetaSi 3 N 4 coatings were obtained by chemical vapor deposition in a fused‐silica reaction tube by outside heating of the system SiCl 4 ‐NH 3 ‐N 2 at a deposition temperature (reaction tube temperature) of 1300°C, whereas α‐ and α+β‐phase coatings were obtained at depositon temperatures of 1150° and 1250°C, respecively. Formation of β‐phase coatings at relatively low temperatures is explained in terms of the effect of a catalytic impurity, SiO vapor from the reaction tube. The X‐ray diffraction patterns and sulface morphologies of the coatings were studied.