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Reaction of Fused Silica With Hydrogen Gas
Author(s) -
TSO STEPHEN T.,
PASK JOSEPH A.
Publication year - 1982
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1982.tb10514.x
Subject(s) - activation energy , hydrogen , desorption , volumetric flow rate , reaction rate , chemistry , atmospheric temperature range , rate determining step , limiting , analytical chemistry (journal) , materials science , thermodynamics , catalysis , adsorption , organic chemistry , mechanical engineering , physics , engineering
Fused silica and flowing hydrogen gas react in the experimental temperature range of 1200° to 1400°C to form SiO and H 2 O vapors. Above a critical flow rate of hydrogen gas, the reaction rate is independent of gas flow rate and is not transport‐controlled. The apparent activation energy for the overall process was 343±33 kj /mol (82±8 kcal/mol). The rate‐limiting step is deduced to be desorption of the product from the glass surface.