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Effects of Oxidation and Oxidation Under Load on Strength Distributions of Si 3 N 4
Author(s) -
EASLER T. E.,
BRADT R. C.,
TRESSLER R. E.
Publication year - 1982
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1982.tb10451.x
Subject(s) - materials science , transient (computer programming) , composite material , computer science , operating system
The room‐temperature strength distributions of a sintered and a hot‐pressed Si 3 N 4 were examined in the as‐machined condition, after oxidation at 1370°C and after oxidation under load at 1370°C. The strength‐controlling flaw populations were highly transient in nature. Both the duration of oxidation and the magnitude of the applied load were observed to effect changes in strength. This dynamic situation is related to both strengthening and weakening processes, which at times may occur simultaneously in the same strength distribution.