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Integrated Intensities and Lattice Parameters for Mo 5 Si 3
Author(s) -
Naidu S.V.N.,
Mays C. F.,
Houska C.R.
Publication year - 1982
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1982.tb10419.x
Subject(s) - tetragonal crystal system , lattice (music) , diffraction , materials science , crystallography , crystal structure , x ray crystallography , space group , analytical chemistry (journal) , chemistry , physics , optics , chromatography , acoustics
An expanded listing of experimental and calculated X‐ray diffraction integrated intensities as well as “d” spacings is given for Mo s Si). The intensity data are found to be in excellent agreement with the space group 14/mem (x =0.075, y =0.224 for Mo positions and x ∼0.167 for Si). Mo 5 Si 3 lattice parameters, corresponding to the tetragonal system, and a =0.96425 ± 0.00005, c =0.49096 ±0.00003 mm.