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Oxygen Diffusion in Sapphire
Author(s) -
REDDY K.P.R.,
COOPER A.R.
Publication year - 1982
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1982.tb09944.x
Subject(s) - oxygen , analytical chemistry (journal) , diffusion , materials science , effective diffusion coefficient , atmospheric temperature range , sapphire , chemistry , thermodynamics , chromatography , optics , medicine , laser , physics , organic chemistry , radiology , magnetic resonance imaging
Oxygen self‐diffusion in alumina single crystals was investigated, using the proton activation technique to measure the 18 O profiles after the samples had been exchanged with an 18 O‐enriched gaseous environment. In the temperature range 1750 to 1950 K, the diffusion coefficient for a set of Czoch‐ralski‐grown samples, preannealed in air, is represented bySamples which were not preannealed showed much greater penetration of 18 O and the concentration profiles in these samples were not consistent with Fickian behavior. Titania‐doped samples gave lower values of oxygen diffusion coefficient.