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Interdiffusion and Phase‐Boundary Reaction Between Silicate Glass Surface and Aqueous CsCl Solution
Author(s) -
Franek H. J.,
Wegener W.,
Frischat G. H.
Publication year - 1982
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1982.tb09928.x
Subject(s) - silicate , aqueous solution , silicate glass , penetration (warfare) , materials science , phase (matter) , analytical chemistry (journal) , ion , mineralogy , penetration depth , phase boundary , dissolution , chemical engineering , chemistry , composite material , chromatography , optics , physics , organic chemistry , operations research , engineering
Technical silicate glass samples with fresh fracture surfaces or HF‐etched surfaces were treated in aqueous CsCl at 90°C for 10 to 85 min. Reaction profiles were determined quantitatively using a SIMS technique. The Cs 2 O concentration at the glass surface increased with increasing time, followed by penetration of Cs + ions into the glass. The profiles can be described assuming a model which contains both a surface phase‐boundary process and an interdiffusion process in the glass for which D=5.10 −17 cm 2 s −1 .