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The Thermodynamic Properties of Silicon Oxynitride
Author(s) -
Fegley M. Bruce
Publication year - 1981
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1981.tb10333.x
Subject(s) - silicon oxynitride , silicon , thermodynamics , standard enthalpy of formation , materials science , enthalpy , entropy (arrow of time) , chemistry , physics , metallurgy , silicon nitride
A critical assessment of thermal and equilibrium data for silicon oxynitride (Si 2 N 2 O) is presented. Selected values for the heat of formation of Si 2 N 2 O from the elements and the absolute entropy of Si 2 N 2 O at 298.15 K are ΔH 0 f,298 =−947.7 ± 5.4 kJ/mol and S 0 298 = 45.35 ± 0.4 J/mol·K, respectively. A table of thermodynamic functions for Si 2 N 2 Ofrom 298 to 2500 K, which has been calculated from the analysis of the literature data, is also presented.