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A New Si 3 N 4 Material: Phase Relations in the System Si‐Sc‐O‐N and Preliminary Property Studies
Author(s) -
Morgan P. E. D.,
Lange F. F.,
Clarke D. R.,
Davis B. I.
Publication year - 1981
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1981.tb10289.x
Subject(s) - materials science , silicon nitride , phase (matter) , polyphase system , silicon , nitride , alloy , creep , mineralogy , crystallography , analytical chemistry (journal) , metallurgy , composite material , chemistry , electronic engineering , organic chemistry , layer (electronics) , engineering , chromatography
A new polyphase silicon nitride alloy has been developed using Sc 2 O 3 as a densification aid. Subsolidus phase relations in the system Si‐Sc‐O‐N are reported together with preliminary oxidation and compressive creep results of a representative composition in the Si 3 N 4 ‐Si 2 N 2 O‐Sc 2 Si 2 O 7 phase field. Microstructural observations of the material are also presented.