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Vapor Pressures of Simple Silicate Glass Melts
Author(s) -
Kassis N.,
Frischat G. H.
Publication year - 1981
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1981.tb09566.x
Subject(s) - vaporization , knudsen number , effusion , vapor pressure , silicate , silicate glass , water vapor , partial pressure , chemistry , thermodynamics , analytical chemistry (journal) , materials science , mineralogy , chromatography , organic chemistry , physics , oxygen
Partial and total vapor pressures over Na 2 O.3SiO 2 anhd Rb 2 O.3SiO z melts were determined at 1150° to 1300°C with the Knudsen‐effusion method. A Pt Knudsen cell was placed on a microbalance so that the weight loss due to effusion from the Knudsen hole could be recorded continuously. The specific vaporization rates are between ∼3.10 −6 and 3.10 −4 gcm −2 s −1 ; the corresponding vapor pressures are between ∼3.10 −2 and 3 Pa.