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The Role of Cerium Orthosilicate in the Densification of Si 3 N 4
Author(s) -
MAH TAIIL,
MAZDIYASNI K. S.,
RUH ROBERT
Publication year - 1979
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1979.tb18795.x
Subject(s) - orthosilicate , cerium , monoclinic crystal system , materials science , sintering , silicon nitride , silicon , mineralogy , nitride , crystallography , lattice (music) , analytical chemistry (journal) , crystal structure , tetraethyl orthosilicate , metallurgy , chemistry , nanotechnology , physics , layer (electronics) , chromatography , acoustics
The existence of compounds between Si 3 N 4 ‐CeO 2 and Si 3 N 4 ‐Ce 2 O 3 was investigated for firing temperatures of 1600° to 1700°C. The two new monoclinic compounds found were Ce 2 O 3 ·2Si 3 N 4 with lattice parameters a = 16.288, b = 4.848, and c =7.853 Å and β=91.54° and Ce 4 Si 2 O 7 N 2 with lattice parameters a = 10.360, b = 10.865, and c =3.974 Å and β=90.33°. Cerium orthosilicate (Ce 4.67 (SiO 4 ) 3 O) is present during firing as a glassy intermediate phase which promotes sintering and densification and then reacts with silicon nitride to form cerium silicon oxynitrde (CeSiO 2 N).