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Bubble Formation in Glass by Reaction with Silicon and Silicon‐Germanium Alloys
Author(s) -
EAGAN ROBERT J.,
JONES GARY J.
Publication year - 1975
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1975.tb11480.x
Subject(s) - silicon , germanium , materials science , bubble , silicon germanium , mineralogy , silica glass , chemical engineering , metallurgy , composite material , chemistry , parallel computing , computer science , engineering
The cause of bubbles at a glass/Si, glass/SiGe interface, which form when some glasses are fused on Si or SiGe, was determined. Water, bonded as OH groups in the glass, was reduced by the Si at high temperatures to form H 2 . The gas released by this reaction formed bubbles only in those glasses with low permeability to H 2 .