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Oxidation Kinetics of Powdered Silicon Nitride
Author(s) -
HORTON RALPH M.
Publication year - 1969
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1969.tb11195.x
Subject(s) - tridymite , kinetics , activation energy , silicon nitride , oxygen , silicon , materials science , chemistry , partial pressure , nitride , analytical chemistry (journal) , chemical engineering , inorganic chemistry , cristobalite , metallurgy , nanotechnology , chromatography , organic chemistry , quartz , physics , layer (electronics) , quantum mechanics , engineering
The oxidation kinetics of powdered silicon nitride were studied in dry oxygen and dry air at 1 atm pressure between 1065° and 1340°C. An automatic recording electrobalance was used to measure the weight gain as a function of time. Parabolic oxidation kinetics were observed with an activation energy of 61 kcal/mol in dry oxygen and 68 kcal/mol in dry air. The oxidation rate in dry oxygen was approximately twice that in air. The solid oxidation product was tridymite above 1125°C and amorphous silica at 1067°C.