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Etching of Refractories and Cermets by Ion Bombardment
Author(s) -
BIERLEIN T. K.,
NEWKIRK H. W.,
MASTEL B.
Publication year - 1958
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/j.1151-2916.1958.tb13540.x
Subject(s) - cermet , materials science , metallurgy , carbide , microstructure , oxide , scanning electron microscope , titanium , etching (microfabrication) , titanium carbide , titanium diboride , composite material , ceramic , layer (electronics)
Uranium oxide, aluminum oxide, and porcelain, as well as aluminum‐aluminum oxide (SAP), a nickel‐titanium carbide base cermet (Kentanium K‐152‐B), and a cobalt silicide‐titanium carbide, titanium diboride cermet (designated III‐B), typical examples of refractories and cermets, have been satisfactorily etched by ion bombardment for subsequent optical and electron microscope study. The method used is similar in almost all respects to the ion etching of metallic specimens. Representative optical and electron micrographs illustrate the applicability of the method for developing the microstructure of refractories and cermets.