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Chemical Analysis of the Surface of Silicone Modified by Oxygen Plasma Treatment for Cell Adhesion
Author(s) -
Yamada Tai,
Ohsugi Ikuko,
Inoue Yoshikazu,
Mizuno Kiyoyuki,
Okumoto Takayuki,
Yoshimura Yohko
Publication year - 2005
Publication title -
wound repair and regeneration
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.847
H-Index - 109
eISSN - 1524-475X
pISSN - 1067-1927
DOI - 10.1111/j.1067-1927.2005.130116p.x
Subject(s) - silicone , x ray photoelectron spectroscopy , adhesion , scanning electron microscope , materials science , oxygen , chemistry , composite material , polymer chemistry , chemical engineering , organic chemistry , engineering
Aim: As we confirmed O 2 plasma treatment is useful for cell adhesion and growth on silicone surface by the culture experiment, reported in the other paper (Ohsugi et al). We aimed to confirm the change of the surface of silicone by O 2 plasma treatment from the material‐scientific view. Material: All materials were cut from a medical grade silicone mammary implant as the same sized disks. Group 1 is silicone disks with no treatment on material's surface. Group 2 is silicone disks with surface modifications by O 2 plasma treatment for 3 minutes. Group 3 is silicone disks with surface modifications by O 2 plasma treatment for 10 minutes. Method: We investigated each group by the scanning electron microscope (SEM), the atomic force microscope (AFM), and X‐ray photoelectron spectoroscopy (XPS). Result: As SEM and AFM shows, after O 2 plasma treatment for 3 minutes, an original inequality formation (10 μm in width) on a surface of silicone were made flat, and for 10 minutes a crack formation occurred. From investigation by XPS, after O 2 plasma treatment for 3 minutes, the ratio of oxygen on the surface of silicone increased. This phenomenon was thought that hydrophilic functional groups (‐OH, ‐COOH, etc.) were grafted on the surface of silicone. We supposed this is the reason why cell adhesion and growth became more effective.