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FIB‐induced damage in silicon
Author(s) -
RUBANOV S.,
MUNROE P. R.
Publication year - 2004
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.0022-2720.2004.01327.x
Subject(s) - gallium , materials science , silicon , focused ion beam , amorphous solid , transmission electron microscopy , beam (structure) , recoil , layer (electronics) , ion beam , composite material , ion , crystallography , nanotechnology , optics , optoelectronics , metallurgy , chemistry , atomic physics , physics , organic chemistry
Summary The damage created in silicon transmission electron microscope specimens prepared using a focused ion beam miller is assessed using cross‐sections of trenches milled under different beam conditions. Side‐wall damage consists of an amorphous layer formed by direct interaction with the energetic gallium ion beam; a small amount of implanted gallium is also detected. By contrast, bottom‐wall damage layers are more complex and contain both amorphous films and crystalline regions that are richer in implanted gallium. More complex milling sequences show that redeposition of milled material, enriched in gallium, can occur depending on the geometry of the mill employed. The thickness of the damage layers depends strongly on beam energy, but is independent of beam current. Monte Carlo modelling of the damage formed indicates that recoil silicon atoms contribute significantly to the damaged formed in the specimen.