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Application of transmission electron microscopes to nanometre‐sized fabrication by means of electron beam‐induced deposition
Author(s) -
Shimojo M.,
Mitsuishi K.,
Tanaka M.,
Han M.,
Furuya K.
Publication year - 2004
Publication title -
journal of microscopy
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.569
H-Index - 111
eISSN - 1365-2818
pISSN - 0022-2720
DOI - 10.1111/j.0022-2720.2004.01307.x
Subject(s) - electron beam induced deposition , acceleration voltage , field emission gun , scanning electron microscope , materials science , nanometre , transmission electron microscopy , cathode ray , deposition (geology) , conventional transmission electron microscope , fabrication , optics , scanning transmission electron microscopy , field electron emission , optoelectronics , microscope , substrate (aquarium) , beam (structure) , electron , environmental scanning electron microscope , nanotechnology , physics , composite material , alternative medicine , oceanography , pathology , biology , paleontology , quantum mechanics , medicine , sediment , geology
Summary Electron beam‐induced deposition was carried out using a scanning transmission electron microscope with a field emission gun to fabricate nanometre‐sized structures. A small amount of a metal–organic gas was introduced near the substrate in the microscope chamber, and focused electron beams were irradiated. Two‐ and three‐dimensional structures were fabricated by scanning the beam position. The minimum line width of the freestanding structures was 8 nm at a constant gas flux used. This line width of 8 nm is considered to be achieved by employing a high accelerating voltage, which leads to a small probe size, and the optimum scanning speed.