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Radiation hardening of silica glass through fictive temperature reduction
Author(s) -
Lancry Matthieu,
Babu B. Hari,
Ollier Nadège,
Poumellec Bertrand
Publication year - 2017
Publication title -
international journal of applied glass science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 34
eISSN - 2041-1294
pISSN - 2041-1286
DOI - 10.1111/ijag.12271
Subject(s) - materials science , radiation , silica glass , irradiation , photoluminescence , hardening (computing) , radiation hardening , electron paramagnetic resonance , paramagnetism , crystallographic defect , atmospheric temperature range , analytical chemistry (journal) , nuclear magnetic resonance , composite material , condensed matter physics , optoelectronics , optics , thermodynamics , chemistry , physics , layer (electronics) , nuclear physics , chromatography
The aim of this article was to report the effects of γ‐radiation on type‐I Infrasil silica glass with different fictive temperatures, T f , for harsh environment applications. Radiation‐induced attenuation in the visible range is found to be much lower in low fictive temperature samples. Photoluminescence experiments show that glasses with higher fictive temperatures have a higher nonbridging oxygen hole centers defect concentration generated by irradiation. In addition, electron paramagnetic resonance studies reveal higher E’ point defects, AlOHC, and hydrogen( II ) defects in high T f samples. In general, we find that the γ‐radiation “hardness” of Infrasil301 silica glass becomes significantly higher with decreasing fictive temperature.