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Ultrashort pulse laser processing of silica at high repetition rates—from network change to residual strain
Author(s) -
Zimmermann Felix,
Lancry Matthieu,
Plech Anton,
Richter Sören,
Ullsperger Tobias,
Poumellec Bertrand,
Tünnermann Andreas,
Nolte Stefan
Publication year - 2017
Publication title -
international journal of applied glass science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.383
H-Index - 34
eISSN - 2041-1294
pISSN - 2041-1286
DOI - 10.1111/ijag.12221
Subject(s) - materials science , laser , volume (thermodynamics) , residual stress , quenching (fluorescence) , silica glass , residual , strain (injury) , repetition (rhetorical device) , ultimate tensile strength , scattering , optics , strain rate , pulse (music) , composite material , thermodynamics , fluorescence , medicine , linguistics , philosophy , physics , algorithm , detector , computer science
We report on the analysis of silica‐based glasses after processing with ultrashort laser pulses at high repetition rates. Heat accumulation leads to strong local heating of the glass. The subsequent quenching results in a fictive temperature rise that scales with the repetition rate. Consequently, the relative volume change leads to residual tensile strain within the modified volume of larger than 10 −3 , which is confirmed by wide‐angle X‐ray scattering ( WAXS ) measurements. Studying the surface topography after cleaving of laser‐modified regions allows for quantification of the corresponding elastic strain as well as the glass density behavior on the fictive temperature.