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Structural investigation of Al 2 O 3 coatings by PECVD with a high deposition rate
Author(s) -
Zhang Song,
Zheng Long,
Wei Geng,
Guo Litong,
Li Jun,
Tu Rong,
Zhang Lianmeng,
Goto Takashi,
Ohmori Hitoshi
Publication year - 2019
Publication title -
international journal of applied ceramic technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.4
H-Index - 57
eISSN - 1744-7402
pISSN - 1546-542X
DOI - 10.1111/ijac.13221
Subject(s) - microstructure , materials science , deposition (geology) , plasma enhanced chemical vapor deposition , cubic zirconia , yttria stabilized zirconia , phase (matter) , chemical vapor deposition , substrate (aquarium) , chemical engineering , composite material , metallurgy , nanotechnology , ceramic , chemistry , paleontology , oceanography , organic chemistry , sediment , geology , engineering , biology
The deposition of alumina on thermal barrier coatings can effectively avoid hot corrosion and increase durability. Al 2 O 3 coatings were prepared on an yttria‐stabilized zirconia ( YSZ ) substrate by plasma chemical vapor deposition ( CVD ). The effects of microwave power ( P M ) and total pressure ( P tot ) on the crystalline phase and microstructure of Al 2 O 3 coatings were investigated, and the effect of the mechanism on the deposition rate was also analyzed. The α‐Al 2 O 3 coatings with a needle‐like microstructure were formed at a higher P M and P tot , whereas the γ‐phase coatings exhibited a cauliflower‐like microstructure at a lower P M and P tot . A maximum deposition rate ( R dep ) of 58 μmh −1 was obtained, which is significantly higher than those of conventional CVD methods.