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Declining prevalence of allergic contact dermatitis caused by toslyamide/formaldehyde in nail polish
Author(s) -
Lee Senhong,
Maor Danit,
Palmer Amanda,
Nixon Rosemary L.
Publication year - 2018
Publication title -
contact dermatitis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.524
H-Index - 96
eISSN - 1600-0536
pISSN - 0105-1873
DOI - 10.1111/cod.13020
Subject(s) - skin cancer , medicine , allergic contact dermatitis , foundation (evidence) , dermatology , cancer , history , archaeology , allergy , immunology
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