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Measuring Symmetry in Drawings of Graphs
Author(s) -
Welch E.,
Kobourov S.
Publication year - 2017
Publication title -
computer graphics forum
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.578
H-Index - 120
eISSN - 1467-8659
pISSN - 0167-7055
DOI - 10.1111/cgf.13192
Subject(s) - computer science , symmetry (geometry) , graph , measure (data warehouse) , graph drawing , theoretical computer science , feature (linguistics) , artificial intelligence , mathematics , geometry , data mining , linguistics , philosophy
Layout symmetry is an important and desired feature in graph drawing. While there is a substantial body of work in computer vision around the detection and measurement of symmetry in images, there has been little effort to define and validate meaningful measures of the symmetry of graph drawings. In this paper, we evaluate two algorithms that have been proposed for measuring graph drawing symmetry, comparing their judgments to those of human subjects, and investigating the use of stress as an alternative measure of symmetry. We discuss advantages and disadvantages of these measures, possible ways to improve them, and implications for the design of algorithms that optimize the symmetry in the layout.