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Er 3+ ‐doped amorphous tellurite thin films
Author(s) -
Ramanan Pradeep,
Gutwirth Jan,
Slang Stanislav,
Viswanathan Anupama,
Ghanawi Taghrid,
Starecki Florent,
Nazabal Virginie,
Roussey Matthieu,
Němec Petr,
Petit Laeticia
Publication year - 2025
Publication title -
journal of the american ceramic society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.9
H-Index - 196
eISSN - 1551-2916
pISSN - 0002-7820
DOI - 10.1111/jace.20589
Subject(s) - doping , amorphous solid , thin film , materials science , mineralogy , chemical engineering , analytical chemistry (journal) , chemistry , optoelectronics , crystallography , nanotechnology , chromatography , engineering
Abstract Radio‐frequency (RF) magnetron sputtering was used to deposit amorphous tellurite thin films from glassy targets from TeO 2 –ZnO–Na 2 O/BaO/Bi 2 O 3 system doped with 2.5 mol% of Er 2 O 3 . The impact of the sputtering power on the optical, luminescence, and structural properties of the films is discussed. The deposition process leads to amorphous and transparent films which emit light in the visible and near‐infrared confirming the presence of Er 3+ in the films’ network. Owing to their large refractive index and stability overtime, the Bi containing films are potential materials for integrated photonics and optical switches.
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