Tailoring the Structure of Multilayered Hybrid Silicon Vertical Waveguide to Achieve Anomalous Dispersion

In order to decrease the dispersion of the silicon vertical slot waveguide, we propose a multilayered hybrid silicon vertical waveguide structure. This multilayered waveguide is formed by three low-refractive-index regions interleaved with two narrow silicon rails. Simulation shows that the optical field in the central low-index region is enhanced. After optimization, the dispersion of the waveguide can be limited within ±300 ps/nm/km from 1450 to 1950 nm. This multilayered waveguide has potential in on-chip nonlinear optical applications, such as in all-optical signal processing.