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A Highly Sensitive Optical Sensor Design by Integrating a Circular-Hole Defect With an Etched Diffraction Grating Spectrometer on an Amorphous-Silicon Photonic Chip
Author(s) -
J. Song,
Y. Z. Li,
X. Zhou,
X. Li
Publication year - 2012
Publication title -
ieee photonics journal
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.725
H-Index - 73
eISSN - 1943-0655
pISSN - 1943-0647
DOI - 10.1109/jphot.2012.2188097
Subject(s) - engineered materials, dielectrics and plasmas , photonics and electrooptics
We present a sensitive optical sensor design by integrating a circular-hole defect with an etched diffraction grating (EDG) spectrometer based on amorphous-silicon photonic platforms. The circular-hole defect obtained from the outdiffusion of the hydrogen in the annealing process can induce strong resonant scattering loss at some special wavelengths. The positions of resonant peaks will linearly shift with the refractive index change of the detected sample (the sensitivity is $\sim$9200 nm/RIU). In addition, the influences of the defect on the sensing characteristics are numerically analyzed based on a scalar diffraction method and a Green tensor technology.

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