Open AccessAlN/SiC MEMS for High-Temperature Applications
Author(s) -
Giovanni Esteves,
S. Habermehl,
Peggy J. Clews,
Chanju David Fritch,
Benjamin A. Griffin
Publication year - 2019
Publication title -
journal of microelectromechanical systems
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.596
H-Index - 143
eISSN - 1941-0158
pISSN - 1057-7157
DOI - 10.1109/jmems.2019.2923919
Subject(s) - materials science , temperature coefficient , pmut , electromechanical coupling coefficient , nitride , microelectromechanical systems , silicon carbide , annealing (glass) , fabrication , optoelectronics , piezoelectricity , silicon nitride , composite material , silicon , layer (electronics) , medicine , alternative medicine , pathology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom