Open AccessLithium-Intercalated Graphene Interconnects: Prospects for On-Chip Applications
Author(s) -
Atul Kumar Nishad,
Rohit Sharma
Publication year - 2016
Publication title -
ieee journal of the electron devices society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.69
H-Index - 31
ISSN - 2168-6734
DOI - 10.1109/jeds.2016.2614813
Subject(s) - components, circuits, devices and systems , engineered materials, dielectrics and plasmas
This paper establishes the importance of the lithium (Li) intercalation in multilayer graphene nanoribbon (MLGNR) interconnects for obtaining superior performance than conventional copper (Cu) on-chip interconnects. For the first time, we report performance analysis of Li-intercalated MLGNRs for local interconnect applications. In that, interconnect thickness is optimized for obtaining lowest delay and energy-delay-product (EDP). At 12 μm interconnect length, our optimized Li-intercalated MLGNRs exhibit (≈ 22.9 ps)1.9x and 4.1x lower delay and EDP, respectively, when compared to Cu. Even in presence of edge roughness, they exhibit (≈ 31.8 ps)1.37x and 2.5x lower delay and EDP, respectively, when compared to Cu. Our analysis quantitatively proves the potential of Li-intercalated MLGNRs for local interconnect applications.