Open AccessSoft X‐ray ARPES for three‐dimensional crystals in the micrometre region
Author(s) -
Muro Takayuki,
Senba Yasunori,
Ohashi Haruhiko,
Ohkochi Takuo,
Matsushita Tomohiro,
Kinoshita Toyohiko,
Shin Shik
Publication year - 2021
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577521007487
Subject(s) - angle resolved photoemission spectroscopy , optics , beamline , microbeam , materials science , x ray photoelectron spectroscopy , photoemission spectroscopy , monochromator , synchrotron , physics , beam (structure) , nuclear magnetic resonance , condensed matter physics , electronic structure , wavelength
An endstation dedicated to angle‐resolved photoemission spectroscopy (ARPES) using a soft X‐ray microbeam has been developed at the beamline BL25SU of SPring‐8. To obtain a high photoemission intensity, this endstation is optimized for measurements under the condition of grazing beam incidence to a sample surface, where the glancing angle is 5° or smaller. A Wolter mirror is used for focusing the soft X‐rays. Even at the glancing angle of 5°, the smallest beam spot still having a sufficient photon flux for ARPES is almost round on the sample surface and the FWHM diameter is ∼5 µm. There is no need to change the sample orientation for performing k x − k y mapping by virtue of the electron lens with a deflector of the photoelectron analyzer, which makes it possible to keep the irradiation area unchanged. A partially cleaved surface area as small as ∼20 µm was made on an Si(111) wafer and ARPES measurements were performed. The results are presented.