Open AccessThe effect of longer‐range waviness on X‐ray reflectivity measurements
Author(s) -
Cole Jacob A.,
Cuadra Jefferson A.,
Panas Robert M.,
Smith Stuart T.
Publication year - 2021
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577520013314
Subject(s) - waviness , x ray reflectivity , profilometer , optics , materials science , surface finish , polishing , atomic force microscopy , root mean square , surface roughness , reflectometry , x ray optics , interferometry , splash , range (aeronautics) , reflectivity , x ray , physics , composite material , nanotechnology , time domain , quantum mechanics , meteorology , computer science , computer vision
A model for calculating the X‐ray reflectivity (XRR) of surfaces to extract both roughness and waviness features is presented. Expressions of reflectivity intensity are derived as a function of root‐mean‐square (RMS) roughness σ, RMS waviness σ L , and the cut‐off frequency between the features ω 0 . Experiments were conducted at the Advanced Light Source at Lawrence Berkeley National Laboratory, beamline 8.3.2, on BK7 glass manufactured with a multi‐step polishing process to validate the model, and were compared with atomic force microscopy (AFM), Fizeau interferometry and surface profilometry measurements. The parameter results and their deviations for XRR measurements were σ = 2.9 ± 0.2 nm and σ L = 14.6 ± 0.5 nm with a wavelength cut‐off of 1/(18 ± 2) µm −1 , while the results from the AFM, Fizeau and profilometry measurements were σ AFM = 3.4 ± 0.4 nm, σ L ,Fizeau = 21.6 nm, σ prof = 4.0 ± 0.1 nm, and σ L ,prof = 21.4 ± 0.1 nm with cut‐offs for the profilometry and Fizeau measurements limited to frequencies of (1/16) µm −1 to (1/4) mm −1 .