
Focus characterization of an X‐ray free‐electron laser by intensity correlation measurement of X‐ray fluorescence
Author(s) -
Nakamura Nami,
Matsuyama Satoshi,
Inoue Takato,
Inoue Ichiro,
Yamada Jumpei,
Osaka Taito,
Yabashi Makina,
Ishikawa Tetsuya,
Yamauchi Kazuto
Publication year - 2020
Publication title -
journal of synchrotron radiation
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.172
H-Index - 99
ISSN - 1600-5775
DOI - 10.1107/s1600577520009868
Subject(s) - optics , free electron laser , x ray , cathode ray , laser , beam (structure) , physics , x ray fluorescence , electron , intensity (physics) , characterization (materials science) , fluorescence , materials science , nuclear physics
This paper proposes and demonstrates a simple method using the intensity correlation of X‐ray fluorescence to evaluate the focused beam size of an X‐ray free‐electron laser (XFEL). This method was applied to the sub‐micrometre focused XFEL beam at the SPring‐8 Angstrom Compact Free Electron Laser, and the beam size evaluated using the proposed method was consistent with that measured using the knife‐edge scan method. The proposed method is readily applicable to extremely small X‐ray spots and can be applied for the precise diagnostics of sub‐10 nm focused X‐ray beams which have recently emerged.